300mm Wafers
- All CDs and die sizes are what the mask was built to and are expressed at the wafer plane
- The % Clear is the area coverage analysis data that is supplied by the mask shop
- AZ = positive tone; BZ = reverse tone
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400 |
Interconnect Unified Reticle set for ASML 193. 130nm node. |
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[RFQ] | |||||||||||||||||||||||||||||||||||||||||
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401 |
Quick Cleave Binary line/space poly reticle. Dense and iso lines at varying pitches |
Reticle Specs (.PDF) | ||||||||||
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[RFQ] | |||||||||||
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402 |
Quick Cleave Binary via reticle. Dense and iso vias at varying pitches, smallest via is 0.12 µm |
Reticle Specs (.PDF) | ||||||||||
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[RFQ] | |||||||||||
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454 |
CMP LowK and Copper Damascene reticle |
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[RFQ] | |||||||||||
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484 |
STI Test Reticle. Minimum feature size is 130nm Trench. |
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[RFQ] | |||||||||||
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700 |
248nm Dual Damascene Reticle |
Reticle Specs (.PDF) | ||||||||||||||||||||
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[RFQ] | |||||||||||||||||||||
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754 |
Dual Damascene CMP Development |
Reticle Specs (.PDF) | ||||||||||
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[RFQ] | |||||||||||
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758 |
Dual Damascene ETCH Development |
Reticle Specs (.PDF) | |||||||||||||||
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[RFQ] | ||||||||||||||||
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764 |
MIT STI CMP Test Reticle |
Reticle Specs (.PDF) | ||||||||||
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[RFQ] Appendix |
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790 |
Alternating Phase Shift Reticle - Dense and isolated lines with varying pitches |
Reticle Specs (.PDF) | ||||||||||
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[RFQ] | |||||||||||
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792 |
Attenuated Phase Shift Reticle. Vias at varying pitches |
Reticle Specs (.PDF) | ||||||||||
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[RFQ] | |||||||||||
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QCD3 |
Quick Cleave Reticle - Dense and isolated lines with varying pitches, smallest line is 0.13 µm |
Reticle Specs (.PDF) | ||||||||||
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[RFQ] | |||||||||||
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QCE3 |
Quick Cleave Reticle - Dense and isolated contacts with varying pitches, smallest contact is .16 µm |
Reticle Specs (.PDF) | ||||||||||
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[RFQ] | |||||||||||
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